The HL-700F is a direct write patterning tool that features a minimum feature size of 50 nm. Overlay of better than 100 nm is achievable with automatic alignment capability. A high brightness thermal field emission electron gun together with a 100 Mhz high speed pattern generator enable it to have a throughput much greater than most other nanolithography tools. In addition to standard 3" and 4" wafer holders, the machine has a universal sample holder capable of taking any size chip, wafer or plate up to 6" with adjustable height and tilt. The machine takes standard GDSII format patterns and can accept patterns over the network. Proximity correction is available to help ensure pattern fidelity and minimize process development time. A variety of positive and negative resist processes are available including single layer PMMA and bilayer PMMA, APEX-E, ZEP-520, SNR-200, UV5, UVN2, UVN30 and SAL-601.

• Machine Specifications
• Ebeam Photoresist
• How long will my pattern take to expose?
• Essential Ebeam reference