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SMSi
Film Stress Tester: stresstest
| Description: The Frontier Semiconductor Measurement Systems SMSi 3800 Stress is used to determine the stress induced by deposited films on a substrate. It is a non-contact, optical method -- stress is measured by the change in curvature of a wafer, with and without deposited film, as determined by deflection of a scanning laser beam. For an overview of the in-line characterization tools available at SNF, click <here>. |
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Stanford Nanofabrication Facility Last Modified 07/06/2006 |
