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Furnaces are versatile, horizontal tube systems which can be used for a wide variety of oxidation, diffusion, heat treatment, and deposition processes. The tube furnaces in the three, four-stack systems at SNF can be divided into two categories: LPCVD systems (Low Pressure Chemical Vapor Deposition of various thin films -- for more information, look for this section of the main Equipment List) and atmospheric systems (for oxidation, doping, and annealing heat treatment.) Process capabilities of each furnace system are detailed in the Furnace Process Summary <PDF>. Tylans 1-4 are used for wet and dry oxidation processing. The different tubes offer different levels of contamination control (see the Equipment List for details). For high quality, 6" oxidation, refer to the Thermco Oxidation furnaces. |
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Stanford Nanofabrication Facility Last Modified 07/17/2006 |