General Use Wet Bench: wbgeneral

Description: The general use wet bench is for acid or base processing of non-standard materials (ie, wafer pieces, devices with gold or non-standard metals). It is also used for non-CMOS compatible processing, such as KOH etching. With the appropriate, dedicated glassware, KOH cleanup can be done to decontaminate wafers for later CMOS-compatible processing.

Features:
  • Hot plate for heating solutions in beakers (wbgeneral-hpr)
  • Constant temperature bath (wbgeneral-ctb)
  • Separate drain for HF waste disposal


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Stanford Nanofabrication Facility
webmaestro@snf.stanford.edu
Last Modified 05/09/2007