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Description:
The general use wet bench is for acid or base processing of non-standard
materials (ie, wafer pieces, devices with gold or non-standard metals).
It is also used for non-CMOS compatible processing, such as KOH etching.
With the appropriate, dedicated glassware, KOH cleanup can be done to
decontaminate wafers for later CMOS-compatible processing.
Features:
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Stanford Nanofabrication Facility webmaestro@snf.stanford.edu Last Modified 05/09/2007 |