Process Info: General Use Wet Bench

Process Info
General Use Wet Bench: wbgeneral

Wet Processing Overview
List of Wet Processing Procedures On-line
Chemical Handling Policies at Wet Benches
Wet Etching of Oxide at wbgeneral
Wet Etch Rates of Selected SNF Films
Wet Etch Rates in Standard Etchants
Standard Pre-Diffusion Furnace Clean: <Overview> <@wbgeneral>
Standard Pre-LPCVD or Pre-Metal Deposition Clean: <Overview><@wbgeneral>
Standard Metal Wafer Clean: <Overview> <@wbgeneral>
Non-Standard Metal Wafer Clean (wbgeneral only)• KOH Etching of Silicon
KOH Decontamination
TMAH Etching of Silicon
Hot Phosphoric Etching of Nitride
Triton X-100 Treatment of Buffered Oxide Etchants (BOE)

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Stanford Nanofabrication Facility
webmaestro@snf.stanford.edu
Last Modified 08/29/2003

ats and boils. If you are using a rinse beaker, you must also decontaminate