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| Description: The Metal Wet Bench is used for processing of silicon wafers with standard metals. In addition to the standard dump rinse and spin-rinse-dryer modules, this station also has an aluminum etch hot pot, hot pot for stripping resist from metal-coated wafers, hot pot for final cleaning of metal wafers before anneal, two HF tanks, and a room temperature bath for peroxide solutions. |
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Stanford Nanofabrication Facility Last Modified 07/11/2006 |
