STANDARD METAL CLEAN (std metal @ wbmetal)

Important Notes:

1. Make sure wafers have never had GaAs or non-standard metals on them and have not been in any GaAs or non-standard metal contaminated equipment or beakers.
2. If wafers have been scribed or have resist on them they should get the Resist Strip Metal process at the wbmetal before going into the Standard Metal Clean.

PROCESS

• 5 minutes in PRS1000 @ 40 C
• Dump Rinse (std 6 cycles)
• Spin Dry (Auto: Rinse 120 sec; Dry 280 sec; Resistivity >16 M ohm-cm)
• Dump Rinse (std 6 cycles)
• Spin Dry (Auto; Rinse 120 sec; Dry 280 sec; Resistivity >16 M ohm-cm)

Note: Wafers must be loaded into furnaces within 1 hour after clean -- or re-clean them.