Description: wbnonmetal is a Santa Clara Plastics (now SCP Global Technologies) semi-automated wet etch bench, primarily for stripping photoresist, removing scribe dust and wet oxide etching. This station contains two hot pots and three Teflon tanks, in addition to two automatic dump rinser and a spin/rinse dryer. The available chemical baths are:

• 90% sulfuric acid/hydrogen peroxide ("piranha"), for stripping resist and removing scribe dust (two hot pots)
• 50:1 HF, for etching oxide
• 20:1 BOE, for etching oxide
• 6:1 BOE, for etching oxide

Only 3" and 4" Si, SiGe, and quartz substrates are allowed at this station, subject to Materials compatibility constraints.