Silicide Wet Bench: wbsilicide
Description: The Silicide Wet Bench is for the cleaning of 3" or 4" silicon or SiGe wafers before or after processing through silicide furnaces or for pre-metal clean. Wafers containing Tungsten or Titanium silicides, but no other metals, may be processed here. This station contains sulfuric/peroxide hot pots, an HCl hot pot, and HF tanks in addition to dump rinse and spin-rinse-dry modules. The available chemical baths are:
  • 90% Sulfuric Acid/Hydrogen Peroxide ("piranha") for resist strip
  • 4:1 Sulfuric Acid:Hydrogen Peroxide for removal of trace organics
  • 5:1:1 H2O:H2O2:HCl for removal of trace metal ions
  • 50:1 HF, for oxide etching
  • 6:1 BOE for oxide etching

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Stanford Nanofabrication Facility
Last Modified 07/11/2006