Description: "Wet Benches" are stations for wet etching and cleaning of wafers and devices. ("Litho Benches" in contrast, are used for resist processing.) The various wet benches differ in the specific process modules available and the materials allowed at each station. For information about some of the various wet processes available, click <here>. The available Wet Benches are:

Diffusion Wet Bench (wbdiff)
Solvent Wet Bench (wbsolvent)

Gallium Arsenide Wet Bench (wbgaas)
General Use Wet Bench (wbgeneral)
Metal Wet Bench (wbmetal)
Nitride Wet Bench (wbnitride)
Nonmetal Wet Bench (wbnonmetal)
Silicide Wet Bench (wbsilicide)