Next Meeting: Friday, Feb. 29, 11:30-1 in CIS 101.

In this meeting, as a follow up to Yoshio's meetings with concerned students, we began to build a framework for programs to facilitate labmember involvment in day-to-day operations. We agree on the broader concerns of accountability/metrics/reporting and culture/community. After much discussion, it was decided to focus on expectations of performance. From the original list* compiled by Yoshio, we reorganized volunteers along functional lines:

• Litho Area: Aaron (organizer) J., Il Woong, Steve Z., Renata, Nahid, Maryam (Staff members: Mahnaz, Gary, Mario)
• Etch: Nahid (organizer), Tom, J., Il Woong, Renata, Maryam, Steve Z., Ray (Staff members: Nancy, Elmer, Mike)
• epi/epi2: Onur & Renata (organizers), Raja (Staff members: Maurice, Elmer)
• RTA: Raja (organizer), Tom, Serene (Staff members: Ed, Elmer)
• Furnaces: Maryam (organizer), J., Ray, Il Woong, Renata, Raja (Staff members: Nancy, Maurice, Ted, Ray)
• Metals: J. (organizer) (Staff members: Jeannie, Jim)

In each functional group, one or more labmember volunteered to be the "organizer" for the week (a role which may rotate among group members.) The action items for the next meeting are:

1. Process expectations: The organizer from each group should work with labmember volunteers to come up with criteria for process performance. This should include a specification of what a "standard process" is for a given tool and how the monitor is done (i.e., wafer prep, measurement method, reporting, etc.) It should be general enough to serve as a gage of equipment performance (i.e., test all critical functions, such as gas flows, pressure, temperature, whatever) but specific enough to be applicable to most users' needs. We will review results in the next meeting.
   
   
2. Current trend data: Data is currently being done on a number of tools. Data will be provided to each of the volunteer groups (Mary)
   
   
3. Equipment problem reports: Coral data for uptime and availability will be provided to each of the volunteer groups (Mary.)

At the next meeting, we will share and discuss this data and decide how to proceed next.

*Yoshio's original list:

• Litho (as above)
• epi2 - Onur, Raja
• RTA - Tom, Serene
• pquest - Tom
• p5000etch - J., Il Woong, Renata, Maryam
• stsetch/2 - J., Il Woong, Steve Z., Nahid
• lampoly, J., Ray, Renata
• epi1 - Renata
• tylan LPCVD - J., Ray, Maryam
• tylanbpsg - Il Woong, Renata
• thermocpoly2 - Raja

Action items from previous meetings:

- ASML/Mahnaz/ASML Users: Post procedure and sample wafers for the "granite stone" test for wafer flatness. (Done.)

- ASML/SNF: ASML to provide specs on wafer curvature and handling. SNF to post on local server for users. (In progress -- and in parallel, ASML is collecting data from wafers in-house.)

- ASML/Mahnaz/Epi users: Test curved-wafer to handle-wafer method, where handle-wafer has a trimmed flat. (Not yet done.)

- ASML/Gary S: Gary can now retrieve wafers short of the e-chuck. (Partly done.)

- ASML/SNF: Build an alignment jig for device-wafer to handling-wafer mounting. (Not done).

- SNF: Stress gage. Paul R. will help anyone wishing to use the FSM. Investigating repair of the Flexus (Mary.)

- SNF: Find a way to monitor the plasma-off problem on stsetch1. (Elmer, Paul R.)

- stsetch users: Report plasma-off (and other) observations on Coral.

- Ed/Nahid: Assemble and share data from last year's REU/RET program. (Mostly done.)

- Ed/SNF: Jim McVittie did some contamination characterization experiments on stsetch1 some years ago. We need to obtain and examine these results. (Not done)

- Ed: Present stsetch2 RSM characterization results (at a future Grand Rounds?)

- Ed/J: Acquire and test cool grease. (Not done.)

- Ed/Mary: Contact other STS etch owners (at NNIN sites and elsewhere) and find out what they do for through wafer etching. (Not done)

- SpecMat:Work to resolve Nahid's request. (Not done)

- All: Assemble available etch rate data. (Nancy has zygo etch rates going back to last summer and limited data from before then. If anyone has definitive data from before then, please contact Nancy.)

- Nahid, Mario, Joey, w/input from SNF Staff: Develop an STS etch users survey to gage the user community's needs for DRIE. Survey should include questions about: substrate size requirements; substrates (SOI or not?); etch depth; minimum CD feature requirements (whether CD loss will be acceptable); contamination requirements/acceptable contamination levels; etc. (Mostly done.)