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E-Beam,
SEM & Maskmaking
Hitachi
H-700 F11 Electron Beam System
Micronic
Laser Writer
SEM
Hitachi Model S-800
Optical
Photolithography
Resist
Coat
Headway
Coater
Laurel
Coater
SVG
Resist Coat System
Exposure
Electronic
Visions 620 Aligner
Karl
Suss MA-6 Contact Aligner
Nikon
5:1 Stepper
Ultratech
Model 1000 1:1 Stepper
Canon
2500iE Stepper
Develop
SVG
Develop System
Chemical
Vapor Deposition
Low
Pressure CVD
Tylan
LPCVD Systems
Tylan
LTO
Tylan
Nitride
Tylan
Poly
Tylan
SiGe
Tystar
Doped Poly LPCVD
Plasma
Enhanced CVD
Pacific
Western PECVD System
STS
PECVD System
Epi
ASM
Epsilon II Single-Wafer Epi System
Metallization
& Sputtering
Balzers
450 Sputtering System
Gryphon
Sputtering System
Innotec
ES26C Evaporator
Metalica
Sputtering System
Spectrum
Single Wafer LPCVD System
Dry
Etching
AMT
8100 Hexagonal Etching System
Drytek
100 Plasma Etchers
Lam
Research TCP 9400 Plasma Etcher
Matrix
Plasma Resist Stripper
MRC Low Pressure Reactive Ion Etcher
Applied
Materials P500 Etcher
PlasmaQuest
ECR Etcher
STS
Multiplex ICP Deep Reactive Ion Etcher
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Annealing,
Oxidation & Doping
Furnaces
gaas22
gaas23
Tylan
Atmospheric Furnaces
Tylan
Oxidation
Tylan
Tungsten Anneal
Tylan
Forming Gas Anneal
Rapid Thermal Annealing
AG
4108 RTA System
RTA
AG System
Doping
Varian
350-D Ion Implanter
Tylan
Boron Doping
Tylan
Phosphorous Doping
Wet
Benches
Diffusion
Wet Bench
Solvent
Wet Bench
General
User Wet Bench
Metal
Wet Bench
Nitride
Wet Bench
Nonmetal
Wet Bench
Silicide
Wet Bench
Wafer
Bonding & Sawing
Electronic
Visions 501 Bonder
K&S
Wafer Saw
In-Line
Process Characterization
Gaertner
Ellipsometer
Nanoline
Linewidth Measuring System
Nanospec
Optical Spectrophotometer
Prometrix
Resistivity Mapping System
Stress
Measurement SMSi 3800
SonoGage
Resistivity and Wafer Thickness Measurement
DekTak
Surface Profilometer
SemiCaps
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