EBEAM and OPTICAL PHOTORESISTS
| Resist/Developer | Spin Speed | Thickness | Application | Resolution/thickness |
| SPR 3612/LDD26W | 5000rpm/2000rpm | Programs for 1um & 1.6um | I AND G | 0.6um w/1um |
| SPR 3617M/LDD26W | Programs for 1.2um & 1.6um | Dyed version of SPR3612, for transparent substrates | ||
|
SPR220-7/LDD26W replacement for AZ4620 |
3500rpm/1000rpm | Programs for 7um & 18um | Micromachining | |
| SPR220-3/LDD26W | Thickness range 3 - 4 um | |||
|
AZ4620/MF319 limited access/phase out on 4620 Dev AZ400K limited access/phase out |
4000rpm/1000rpm | Std thickness 7 & 18um | Micromachining | |
|
AZ5214/MF322 |
5000rpm | Reversal | ||
| LOL2000 | Lift off under layer | |||
| SPR 955CM//LDD26W | Coming soon | canon2500 I line | ||
| AZ Developer | Mask Making | |||
| Microposit Concentrate | Mask Making | |||
| EBEAM Resist/Dev* | ||||
| UVN2/CD26* | Neg | |||
| UVN30/CD26* | Neg/like UVN2 | |||
| UV5/LDD26W* | Pos | |||
| SNR200/CD14 | Phase Out/same replaced by UVN2 | |||
| PMMA* 5%/MIBK:IPA 1:2 is std ratio, varies | ||||
| 200 PMMA C5/same* | ||||
| 950 PMMA M2/same* | ||||
| PMMA 200K/same* | ||||
| PMMA 950K 9%/same* | ||||
| PMMA 496K 9%/same* | ||||
| PMGI SF6/PMGI 101* | ||||
| PMGI 6% in cyclopertanon/PMGI 101* | Phase out | |||
| ZEP 520* | ||||
| APEX-E/MF319* | ||||
| SAL601/MF322* | ||||
| Thinners | Use | |||
| Type P Thinner | ||||
| Primers | Use | |||
| MicroPrime HP 100% | svgcoat vapor prime | |||
| P-20 20% HMDS | Spin on option |
|
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Stanford Nanofabrication Facility Last Modified 09/08/2003 |