AZ5214 PHOTORESIST

WHEN is AZ5214 USED?

AZ5214 PROCESS INFORMATION

SVGCoat Program 3 should be setup as follows:

Spin 5 sec 5000 rpm 40 accel
spin (dispense) 10 sec 0.100 rpm 20 accel
spin 5 sec 0.25 rpm 40 accel
spin 30 5.00 rpm 40 accel

 


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Stanford Nanofabrication Facility
Last Modified 08/29/2003