Maskmaking

In-house mask making is done using the Micronic LRS-18 pattern generator.

• The system accepts these input file formats: GDSII, MEBES, Electromask & David Mann. We strongly recommend using GDSII format.
• Mask substrates used are low expansion borosilicate glass, low reflective chrome (film thickness 1000A), coated with AZ1518 positive resist (5000A). The standard size is 5" X 5" X 90 mils.
• The exposure is done using a HeCd laser, with absolute minimum feature size of 1.5um.
• We still retain capability of producing Ultratech reticles (you must include VAM's -vertical alignment marks - in your primary die design and also verniers if you wish to use them).

Mask jobs with specifications exceeding capabilities of LRS-18 will have to be done by an outside vendor. Several resources are listed on this website.

Typical price of masks generated on LRS-18 system depends on current lab charges for staff and machine time and on an area exposed and will be approximately $300.00 for contact or 5X masks and $350.00 for an Ultratech reticle.

To submit a request for maskmaking, please discuss your requirements before submitting your request form.

IMPORTANT NOTE: Masks are ONLY made for USE IN OUR LAB!

For more information or to place an order please contact Paul Jerabek at

phone: (650)723-9245

fax: (650)725-6278

office: CIS #142