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E-Beam,
SEM & Maskmaking
Overview
of Maskmaking at SNF
Maskmaking
for Academic Researchers (SUNet ID)
Making
Transparency Masks
Electron
Beam Lithography Resist Processing
Nikon
Reticle Alignment Marks
Contact
Mask Alignment Marks
Karl
Suss Vacuum Chuck Drawing (for backside maskmaking)
Karl
Suss Alignment Mark Vernier Scale Drawings (PDF format)
ASML Image Field
(1X-Clear in GDSII, Dark
in GDSII or Dark in Tanner DB.)
Optical
Photolithography
Overview of Photolithography Tools
List
of Available Photoresists
Shipley
3612 Photoresist
SPR220
Photoresist
Polyimide
Photoresist
Electron
Beam Photoresists
Lift-off
Processing
Photoresist
for Implant Processing
Wafer
Backside Protection w/Photoresist
Edge
Bead Removal Mask Processing
Photoresist
Exposure Time Table
Manual
Coating Procedures
Manual
Developing Procedures
Image
Reversal Processing
Processing
Clear (Glass, Quartz, Sapphire) Substrates
Maskmaking
Chemical
Vapor Deposition
Tylan
Recipe Index
Metallization
& Sputtering
Comparison
of Sputter Systems
Dry
Etching
Overview
Nitride
Plasma Etch
Oxide
Plasma Etch
Polysilicon
Plasma Etch
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Annealing,
Oxidation & Doping
Tylan
Recipe Index
Oxide
Thickness Calculator
Wet
Processing
General
Chemical Handling Policies
Overview
of Wet Benches
Wet
Etch Rates of Selected SNF Films
Wet
Etch Rates in Standard Etchants
Wet Oxide Etch:
Non-metal
Wafers (wbnonmetal)
Wafers
with Standard Metals (wbmetal)
Non-standard
Materials (wbgeneral)
Use
of Triton X-100 (wbnonmetal, wbmetal & wbgeneral only
Wet Bench Clean Procedures:
Photoresist
Strip Procedures
Non-Standard
Metal Wafer Clean (wbgeneral only)
Standard
Prediffusion Clean Overview (procedures at specific wet benches: wbdiff,
wbgeneral,
wbsilicide)
Standard
Metal Clean Overview (wet bench-specific procedures: wbmetal,
wbgeneral)
Standard
Pre-LPCVD or Pre-Metal Clean Overview (wet-bench-specific procedures:
wbdiff, wbgeneral,
wbsilicide)
Tweezer
Clean Procedures
Other Non-Standard Wet Bench Processes (wbgeneral
only):
KOH
Etching of Silicon
Decontamination following KOH Etch
Non-standard
Nitride Strip
TMAH Etching of Silicon
In-Line
Process Characterization Tools
Summary
of tool capabilities
Process Quals: Procedures
and Trends
Process
Characterization Studies
Process
Resources outside SNF
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