II. RESIST STRIP FOR HEAVY DOSE AND/OR HIGH ENERGY IMPLANTS FOR NON-METAL WAFERS

Matrix O2 asher = matrix

wetbench = wbnonmetal

Repeat Matrix step and Sulfuric Peroxide Strip if necessary.

III. STANDARD SHIPLEY 3612 RESIST STRIP FOR METAL WAFERS

wetbench = wbmetal

Note: Wafers must go into stripper dry.

IV. STANDARD SHIPLEY 3612 RESIST STRIP FOR METAL WAFERS AFTER AMT ETCH

Polymer Strip : this process is to remove polymer buildup from the amtetcher. If not removed, the resist will not strip.

Drytek2 - program = contact cleanup process

Resist Strip:

Note: Wafers must go into stripper dry.

Matrix:

Resist Strip:

Note: Wafers must go into stripper dry.