Triton X-100 can be used as a surfactant to break surface tension on wafers during a BOE wet etch. The most common use in the lab is aid in the etching of oxide for small features.

• The solution in the small bottle is about 10:1 DI:Triton X-100.
• Only a couple of drops added to the BOE (6:1and 20:1 only, not 50:1) is needed.
• Use of the solution is restricted to the Nonmetal, Metal and General wetbenches.
• Once the solution is added to the BOE bath, a note informing users is required.
• Triton X-100 will leave a film on the surface of the wafer which must be removed by the standard resist strip techniques.
• Please inform staff when the bottle is getting empty.